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Topography measurement of earphone dust film

Topography measurement of earphone dust film

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1000

Topography measurement of earphone dust film

Category:
Film
Product serial number
Product description
Parameters

Measurement requirements
Measure the three-dimensional topography of the earphone dust film and detect the defect position on the dust film

 

Overview of key features
1. Non-contact measurement, integrated design

2. Three-dimensional topography scanning, multi-function data processing
3. Suitable for accurate measurement of various materials

4. Simple to use, easy to assemble and disassemble

5. Fast scanning speed and high positioning accuracy

6.±0.5 to ±1μm repeat accuracy guarantee

7. High stability and strong anti-interference ability

 

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Measurement results
The level difference is about 7μm±1μm

 

Solve the problems of the current measuring device 

1. There are certain requirements for measurement materials
2. Contact measurement, damage to the measurement material
3. The measurement range is small, the position is uncertain, and the measurement is difficult
4. The measurement speed is slow, the precision is low, and the measurement error is large

5. Complex structure and high cost

We could not find any corresponding parameters, please add them to the properties table
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